Thermal stability of GaN investigated by Raman scattering

被引:75
作者
Kuball, M
Demangeot, F
Frandon, J
Renucci, MA
Massies, J
Grandjean, N
Aulombard, RL
Briot, O
机构
[1] Univ Bristol, HH Wills Phys Lab, Bristol BS8 1TL, Avon, England
[2] Universite Paul Sabatier, CNRS, Lab Phys Solides Toulouse, F-31062 Toulouse, France
[3] CNRS, CRHEA, F-06560 Valbonne, France
[4] Univ Montpellier 2, CNRS, GES, F-34095 Montpellier 5, France
关键词
D O I
10.1063/1.122052
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the thermal stability of GaN using Raman scattering. Noninvasive optical monitoring of structural damage to GaN by high-temperature anneals in nitrogen ambient has been demonstrated. Characteristic features in the Raman spectrum identify three thermal stability regimes. Thermal damage between 900 and 1000 degrees C results in the appearance of a broad Raman peak between the E-2 and A(1) (LO) phonon. For anneals at temperatures higher than 1000 degrees C emerging macroscopic disorder gives rise to distinct Raman modes at 630, 656, and 770 cm(-1). Below 900 degrees C no thermal damage has been observed. The evolution of the Raman spectrum of GaN with increasing annealing temperature is discussed in terms of disorder-induced Raman scattering. We find clear indications for a reaction at the GaN/sapphire interface for anneals higher than 1000 degrees C. (C) 1998 American Institute of Physics.
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页码:960 / 962
页数:3
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