Photofabrication of surface relief structure - mechanism and application

被引：24

作者：

Fukuda, T

Samaru, K

Kimura, T

Matsuda, H

机构：

[1] Natl Inst Adv Ind Sci & Technol, AIST, Res Inst Photon, Tsukuba, Ibaraki 3058565, Japan

[2] Natl Inst Adv Ind Sci & Technol, AIST, Res Inst Mat & Chem Proc, Tsukuba, Ibaraki 3058565, Japan

来源：

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY | 2001年 / 145卷 / 1-2期

关键词：

photoinduced surface relief; azobenzene polymer; viscous fluid model; micro-fabrication; high-density optical data storage;

D O I：

10.1016/S1010-6030(01)00563-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 [物理化学]; 081704 [应用化学];

摘要：

In order to elucidate the photoinduced surface relief (PSR) phenomenon on azobenzene polymer film, the formulation of the PSR formation process is established analytically from Navier-Stokes equation on the basis of our viscous fluid model. The experimental data obtained by the systematic studies for two-beam coupling and one-dimensional (ID) Gaussian beam irradiation are reproduced very well by the model calculation. The good coincidence assures the feasibility of our theoretical model. Furthermore, an example for applying this phenomenon to 2D micro-image recording and/or high-density optical data storage is presented. (C) 2001 Elsevier Science B.V. All rights reserved.

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页码：35 / 39

页数：5

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