Fabrication of accelerometer using Single-step Electrochemical Etching for Micro Structures (SEEMS)

被引:8
作者
Ohji, H [1 ]
Gennissen, PTJ [1 ]
French, PJ [1 ]
Tsutsumi, K [1 ]
机构
[1] Mitsubishi Elect Corp, Adv Technol R&D Ctr, Amagasaki, Hyogo 6618661, Japan
来源
MEMS '99: TWELFTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST | 1999年
关键词
D O I
10.1109/MEMSYS.1999.746753
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
This paper presents a new wet etching technique for micromachining called SEEMS (Single-step Electrochemical Etching for Micro Structures). An accelerometer structure can be achieved using this SEEMS process. Although, some problems which are involved in SEEMS process had to be solved. Two main problems are, firstly that over etching can be seen at the clamping point of free standing beam and secondly, from the theoretical point of view, it is difficult to remove large region or to make one hole in a large area. These problems can be considerably reduced by improved mask layout and perforated mass supported by single cantilever can be achieved. Additionally, new initial pit formation is demonstrated to make structures which are free from crystal orientation of silicon substrate.
引用
收藏
页码:61 / 65
页数:5
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