Excellent charge offset stability in a Si-based single-electron tunneling transistor

被引:64
作者
Zimmerman, NM [1 ]
Huber, WH
Fujiwara, A
Takahashi, Y
机构
[1] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
[2] NTT Corp, NTT Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
关键词
D O I
10.1063/1.1415776
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have measured the long-term drift and the short-term 1/f noise in the charge offset Q(0)(t) in two Si-based single-electron tunneling transistors (SETTs). In contrast to metal-based SETTs, these devices show excellent charge stability, drifting by less than 0.01e over weeks. The short-term 1/f noise magnitude is similar to the metal-based devices, demonstrating that different mechanisms are responsible for the short-term noise versus the long-term drift. Finally, we show that, in addition to the excellent stability over time, it may be possible to make the devices more robust with respect to voltage-induced instability as well. (C) 2001 American Institute of Physics.
引用
收藏
页码:3188 / 3190
页数:3
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