Thin porous indium tin oxide nanoparticle films:: effects of annealing in vacuum and air

被引:47
作者
Ederth, J
Hultäker, A
Niklasson, GA
Heszler, P
van Doorn, AR
Jongerius, MJ
Burgard, D
Granqvist, CG
机构
[1] Uppsala Univ, Dept Engn Sci, Angstrom Lab, S-75121 Uppsala, Sweden
[2] Univ Szeged, Res Grp Laser Phys, Hungarian Acad Sci, H-6701 Szeged, Hungary
[3] Philips Appl Technol, NL-5600 MD Eindhoven, Netherlands
[4] Nanogate GmbH, D-66121 Saarbrucken, Germany
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2005年 / 81卷 / 07期
关键词
D O I
10.1007/s00339-005-3264-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electrical and optical properties were investigated in porous thin films consisting of In(2)O(3):Sn (indium tin oxide; ITO) nanoparticles. The temperature-dependent resistivity was successfully described by a fluctuation-induced tunneling model, indicating a sample morphology dominated by clusters of ITO nanoparticles separated by insulating barriers. An effective-medium model, including the effect of ionized impurity scattering, was successfully fitted to measured reflectance and transmittance. Post-deposition treatments were carried out at 773 K for 2 h in both air and vacuum. It is shown that vacuum annealing increases either the barrier width or the area between two conducting clusters in the samples and, furthermore, an extra optical absorption occurs close to the band gap. A subsequent air annealing then reduces the effect of the barriers on the electrical properties and diminishes the absorption close to the band gap.
引用
收藏
页码:1363 / 1368
页数:6
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