The influence of growth conditions on the quality of CdZnTe single crystals

被引:26
作者
Franc, J
Grill, R
Hlídek, P
Belas, E
Turjanska, L
Höschl, P
Turkevych, I
Toth, AL
Moravec, P
Sitter, H
机构
[1] Charles Univ, Inst Phys, CZ-12116 Prague 2, Czech Republic
[2] MTA MFA, H-1535 Budapest, Hungary
[3] Johannes Kepler Univ, Inst Semicond Phys, A-4040 Linz, Austria
关键词
D O I
10.1088/0268-1242/16/6/319
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Experimental conditions were investigated for growth of inclusion-free near-stoichiometric CdZnTe single crystals with a minimized concentration of native point defects. The positions of the stoichiometric line P-S = 8 x 10(5) exp(- 1.76 x 10(4)/T) (atm) and the room-temperature and high-temperature pn lines were evaluated from high-temperature in situ galvanomagnetic measurements. The Cd pressure at the congruent melting point was estimated at similar to1.15-1.20 atm from analysis of the total inclusion volume of five single crystals fabricated at Cd pressures in the range of 1-1.3 atm. An inclusion-free single crystal was prepared at P-Cd similar to 1.2 atm. Calculations based on a model of two major defects, the Cd vacancy and the Cd interstitial, show that a very small deviation of PCd from P-S results in a large generation of the native defects. Thus a reproducible production of a high-resistivity material by a slow cooling along the P-S seems to be very difficult.
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页码:514 / 520
页数:7
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