Hole-mask colloidal lithography

被引:495
作者
Fredriksson, Hans [1 ]
Alaverdyan, Yury [1 ]
Dmitriev, Alexandre [1 ]
Langhammer, Christoph [1 ]
Sutherland, Duncan S.
Zaech, Michael [1 ]
Kasemo, Bengt [1 ]
机构
[1] Chalmers Univ Technol, S-41296 Gothenburg, Sweden
关键词
D O I
10.1002/adma.200700680
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Hole-mask colloidal lithography (HCL) represents a truly versatile and simple bottom-up nanofabrication method based on colloidal self-assembly lithographic patterning. The HCL technique provides an effective means of patterning vast surface areas with diverse functional nanoarchitectures. Examples include arrays of nanodiscs, oriented elliptical nanostructures, (binary) nanodisc pairs, nanocones on extended surfaces and nanodiscs embedded in a surrounding, matrix.
引用
收藏
页码:4297 / +
页数:7
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