Electroluminescence from Au/extra-thin Si-rich SiO2 film/n+-Si under reverse biases and its mechanism

被引:8
作者
Li, AP
Bai, GF
Chen, KM
Ma, ZC
Zong, WH
Zhang, YX
Qin, GG [1 ]
机构
[1] Beijing Univ, Dept Phys, Beijing 100871, Peoples R China
[2] 13th Inst Minist Elect Ind, Natl Lab GaAs IC, Shijiazhuang 050051, Peoples R China
基金
中国国家自然科学基金;
关键词
luminescence; silicon oxide; gold; structural properties;
D O I
10.1016/S0040-6090(98)00511-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have fabricated Au/extra-thin Si-rich SiO2 (ETSSO) film/p-Si and Au/ETSSO/n(+)-Si structures and compared their electroluminescence (EL) characteristics. It is found that for the Au/ETSSO/p-Si structure, when the forward bias (a positive voltage is applied to the p-Si substrate with respect to the Au electrode) is larger than 4 V, red light emission is observed, while under bias reverses, no light is emitted. The Au/ETSSO/n(+)-Si structure does not emit light under the forward bias (a positive voltage is applied to the Au electrode with respect to the n(+)-Si substrate), but it emits red light when the reverse bias is greater than a critical value, which correlates with the thickness of the ETSSO film. We have suggested a model for the electroluminescence mechanism of Au/ETSSO/n+-Si structures. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:137 / 139
页数:3
相关论文
共 9 条
[1]   SILICON QUANTUM WIRE ARRAY FABRICATION BY ELECTROCHEMICAL AND CHEMICAL DISSOLUTION OF WAFERS [J].
CANHAM, LT .
APPLIED PHYSICS LETTERS, 1990, 57 (10) :1046-1048
[2]   ELECTROLUMINESCENCE STUDIES IN SILICON DIOXIDE FILMS CONTAINING TINY SILICON ISLANDS [J].
DIMARIA, DJ ;
KIRTLEY, JR ;
PAKULIS, EJ ;
DONG, DW ;
KUAN, TS ;
PESAVENTO, FL ;
THEIS, TN ;
CUTRO, JA ;
BRORSON, SD .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (02) :401-416
[3]   3-DIMENSIONAL QUANTUM WELL EFFECTS IN ULTRAFINE SILICON PARTICLES [J].
FURUKAWA, S ;
MIYASATO, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1988, 27 (11) :L2207-L2209
[4]   QUANTUM SIZE EFFECTS ON THE OPTICAL BAND-GAP OF MICROCRYSTALLINE SI-H [J].
FURUKAWA, S ;
MIYASATO, T .
PHYSICAL REVIEW B, 1988, 38 (08) :5726-5729
[5]   VISIBLE ELECTROLUMINESCENCE FROM SEMITRANSPARENT AU FILM EXTRA THIN SI-RICH SILICON-OXIDE FILM P-SI STRUCTURE [J].
QIN, GG ;
LI, AP ;
ZHANG, BR ;
LI, BC .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (03) :2006-2009
[6]   ELECTROLUMINESCENCE FROM AU NATIVE-OXIDE P-SI AND ITS CORRELATION TO THAT FROM AU POROUS SI [J].
QIN, GG ;
HUANG, YM ;
LIN, J ;
ZHANG, LZ ;
ZONG, BQ ;
ZHANG, BR .
SOLID STATE COMMUNICATIONS, 1995, 94 (08) :607-612
[7]   A COMPARISON STUDY OF ELECTROLUMINESCENCE FROM AU NATIVE-OXIDE P-SI AND AU POROUS-SI DIODES [J].
QIN, GG ;
HUANG, YM ;
ZONG, BQ ;
ZHANG, LZ ;
ZHANG, BR .
SUPERLATTICES AND MICROSTRUCTURES, 1994, 16 (04) :387-390
[8]  
SZE SM, 1981, PHYSICS SEMICONDUCTO
[9]   QUANTUM SIZE EFFECTS ON PHOTOLUMINESCENCE IN ULTRAFINE SI PARTICLES [J].
TAKAGI, H ;
OGAWA, H ;
YAMAZAKI, Y ;
ISHIZAKI, A ;
NAKAGIRI, T .
APPLIED PHYSICS LETTERS, 1990, 56 (24) :2379-2380