Mass spectrometric investigation of the positive ions formed in low-pressure oxygen/tetraethoxysilane and argon/tetraethoxysilane plasmas

被引：5

作者：

Aumaille, K ^{[1
]}

Granier, A ^{[1
]}

Grolleau, B ^{[1
]}

Turban, G ^{[1
]}

机构：

[1] Univ Nantes, CNRS, IMN, Lab Plasmas & Couches Minces, F-44322 Nantes 3, France

来源：

JOURNAL OF APPLIED PHYSICS | 2001年 / 89卷 / 09期

关键词：

D O I：

10.1063/1.1355694

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this article, we report results on mass spectrometric investigation of the positive ions created in a low-pressure radio frequency helicon plasma reactor using oxygen/tetraethoxysilane (O-2/TEOS) and argon/tetraethoxysilane (Ar/TEOS) mixtures. It is shown that the variety of ions is much greater in the Ar/TEOS plasma than in the O-2/TEOS plasma. In the case of the Ar/TEOS plasma, ions are observed up to 343 amu whereas in the case of the O-2/TEOS plasma, ions are observed up to 211 amu. Ion/molecule reaction rates between TEOS parent positive ions and neutral TEOS molecules are considerably less important in the O-2/TEOS plasma as compared with the Ar/TEOS plasma. Using the values of the TEOS dissociation degree measured for O-2/TEOS and Ar/TEOS plasmas, the observed ion/molecule reactions might be explained by the higher concentration of TEOS molecules in the Ar/TEOS plasma.

引用

页码：5227 / 5229

页数：3

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