Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering

被引：64

作者：

You, J. B. ^{[1
]}

Zhang, X. W. ^{[1
]}

Fan, Y. M. ^{[1
]}

Qu, S. ^{[1
]}

Chen, N. F. ^{[1
]}

机构：

[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China

来源：

APPLIED PHYSICS LETTERS | 2007年 / 91卷 / 23期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.1063/1.2822404

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The ZnO films were grown on Ag/Si(001) substrates by sputtering Ag and ZnO targets successively in a pure Ar ambient. A significant enhancement of ZnO ultraviolet emission and a reduction of its full width of half maximum have been observed while introducing a 100 nm Ag interlayer between ZnO film and Si substrate. Furthermore, a complete suppression of the defect related visible emission was also found for the ZnO/Ag/Si sample. This improved optical performance of ZnO is attributed to the resonant coupling between Ag surface plasmon and ultraviolet emission of ZnO. (c) 2007 American Institute of Physics.

引用

页数：3

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