Investigations of the 147 nm radiative efficiency of Xe surface wave discharges

被引：13

作者：

Gibson, ND

Kortshagen, U

Lawler, JE

机构：

[1] University of Wisconsin - Madison, Department of Physics, Madison, WI 53706

来源：

JOURNAL OF APPLIED PHYSICS | 1997年 / 81卷 / 03期

关键词：

D O I：

10.1063/1.363851

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The radiative efficiency of the 147 nm resonance radiation of Xe excited in a low pressure, high-frequency surface wave sustained plasma has been investigated. The radiative UV power has been obtained from optical absorption spectroscopic measurements of the Xe resonance level population and from Monte Carlo calculations of the effective decay rate of this level. Precise measurements of the rf power absorbed by the plasma enable the determination of the absolute vacuum ultraviolet discharge efficiency for the Xe surface wave discharge. Results show efficiencies up to more than 80(+/- 11)%. (C) 1997 American Institute of Physics.

引用

页码：1087 / 1092

页数：6

共 27 条

[1] XENON 147-NM RESONANCE F-VALUE AND TRAPPED DECAY-RATES [J].