Ir and Ru bottom electrodes for (Ba, Sr) TiO3 thin films deposited by liquid delivery source chemical vapor deposition

被引：19

作者：

Lee, WJ

Basceri, C

Streiffer, SK

Kingon, AI

Yang, DY

Park, Y

Kim, HG

机构：

[1] Korea Adv Inst Sci & Technol, Elect Ceram Mat Res Ctr, Yusong Gu, Daejon, South Korea

[2] N Carolina State Univ, Dept Mat Sci & Engn, Raleigh, NC 27695 USA

[3] LG Semicon, Cheongju, South Korea

来源：

THIN SOLID FILMS | 1998年 / 323卷 / 1-2期

关键词：

liquid delivery; bottom electrode structures; chemical vapor deposition;

D O I：

10.1016/S0040-6090(97)01043-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The electrical properties and surface morphologies of (Ba, Sr)TiO3 thin films, with various bottom electrode structures, deposited by liquid delivery metal organic chemical vapor deposition were investigated. Ir and Ru films as a bottom electrode with varying deposition temperatures were prepared onto Sie, and polySi substrate structures using ion beam sputtering technique. It is observed that electrical properties of BST films deposited by liquid delivery MOCVD was changed with the deposition temperatures of Zr and Ru as well as substrate structures. Furthermore, it is revealed that these variations in leakage current could be strongly related with the roughness of BST films. (C) 1998 Published by Elsevier Science S.A. All rights reserved.

引用

页码：285 / 290

页数：6