X-ray diffractometry analysis of rf-magnetron-sputtered chromium chromium nitride coatings

被引:43
作者
Meunier, C [1 ]
Vives, S [1 ]
Bertrand, G [1 ]
机构
[1] Pole Univ Portes Jura, Lab Metrol Interfaces Tech, F-25211 Montbeliard, France
关键词
chromium/chromium nitride coatings; rf magnetron sputtering; X-ray diffractometry analysis;
D O I
10.1016/S0257-8972(98)00586-6
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effect of nitrogen content on the microstructure of chromium-based coatings deposited by r.f. magnetron sputtering was studied using various X-ray diffraction techniques. Cr, Cr2N and CrN were the major phases identified, respectively, for 5, 34 and 50 at.% by recording 8/28 and glancing incidence (1 degrees) scans. Between these well- identified crystallographic structures, we have noted a peak broadening with poor intensities that could be interpreted as mixtures of Cr, Cr2N and/or Cr(N) phases. The influence of nitrogen on the preferred crystal orientation of the films was investigated. Highly textured Cr(110) and CrN (111) were evidenced, and texture was found to be a function of nitrogen content in the sputtering atmosphere. Finally, the Langford method was applied for line profile analyses leading to results concerning crystallite sizes and strains. (C) 1998 Published by Elsevier Science S.A. All rights reserved.
引用
收藏
页码:149 / 158
页数:10
相关论文
共 16 条
[1]   PROPERTIES OF CHROMIUM NITRIDE COATINGS DEPOSITED BY CATHODIC ARC EVAPORATION [J].
AHARONOV, RR ;
COLL, BF ;
FONTANA, RP .
SURFACE & COATINGS TECHNOLOGY, 1993, 61 (1-3) :223-226
[2]   Development of chromium nitride coatings substituting titanium nitride [J].
Berg, G ;
Friedrich, C ;
Broszeit, E ;
Berger, C .
SURFACE & COATINGS TECHNOLOGY, 1996, 86 (1-3) :184-191
[3]   Properties of reactively RF magnetron-sputtered chromium nitride coatings [J].
Bertrand, G ;
Savall, C ;
Meunier, C .
SURFACE & COATINGS TECHNOLOGY, 1997, 96 (2-3) :323-329
[4]   THE INFLUENCE OF PROCESS PARAMETERS ON THE PROPERTIES OF CHROMIUM-NITROGEN COATING BY DC REACTIVE SPUTTERING AT ROOM-TEMPERATURE [J].
CHANG, YG ;
WARSOP, RK ;
FARB, NE ;
PARSONS, R .
SURFACE & COATINGS TECHNOLOGY, 1994, 68 :157-165
[5]  
CHARBONNIER M, 1992, ADV XRAY ANAL, V35, P819
[6]   WEAR-RESISTANCE OF ARC ION-PLATED CHROMIUM NITRIDE COATINGS [J].
CHIBA, Y ;
OMURA, T ;
ICHIMURA, H .
JOURNAL OF MATERIALS RESEARCH, 1993, 8 (05) :1109-1115
[7]   STRESS STATE OF CHROMIUM NITRIDE FILMS DEPOSITED BY REACTIVE DIRECT-CURRENT PLANAR MAGNETRON SPUTTERING [J].
FABIS, PM ;
COOKE, RA ;
MCDONOUGH, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (05) :3809-3818
[8]   INFLUENCE OF SUBSTRATE MATERIAL AND DEPOSITION PARAMETERS ON THE STRUCTURE, RESIDUAL-STRESSES, HARDNESS AND ADHESION OF SPUTTERED CRXNY HARD COATINGS [J].
HERR, W ;
MATTHES, B ;
BROSZEIT, E ;
MEYER, M ;
SUCHENTRUNK, R .
SURFACE & COATINGS TECHNOLOGY, 1993, 60 (1-3) :428-433
[9]  
Knotek O., 1986, High Temperatures - High Pressures, V18, P435
[10]   A QUANTITATIVE MODEL FOR THE EVOLUTION FROM RANDOM ORIENTATION TO A UNIQUE TEXTURE IN PVD THIN-FILM GROWTH [J].
KNUYT, G ;
QUAEYHAEGENS, C ;
DHAEN, J ;
STALS, LM .
THIN SOLID FILMS, 1995, 258 (1-2) :159-169