Quantum calculations of conduction properties of metal/InAlAs/InGaAs heterostructures

被引:2
作者
Podevin, F [1 ]
Vanbésien, O [1 ]
Lippens, D [1 ]
机构
[1] Univ Sci & Tech Lille Flandres Artois, Inst Elect & Microelect Nord, CNRS, UMR 8520, F-59652 Villeneuve Dascq, France
关键词
D O I
10.1063/1.1359756
中图分类号
O59 [应用物理学];
学科分类号
摘要
Quantum calculations of the current-voltage characteristics of metal/wide-gap/narrow-gap semiconductor heterostructures have been performed in order to analyze the pure tunneling and thermally assisted current contributions. The InAlAs/InGaAs material system lattice matched to an InP substrate, with the InAlAs layer acting as a single semiconductor barrier, shows pronounced quantum size effects which yield resonant tunneling paths. On the basis of the nonlinear current-voltage characteristics, it is shown that an optimum barrier configuration can be found. Some consequences from the device viewpoint are finally discussed. (C) 2001 American Institute of Physics.
引用
收藏
页码:6247 / 6252
页数:6
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