Replication technology for optical microsysterns

被引:83
作者
Gale, MT [1 ]
Gimkiewicz, C [1 ]
Obi, S [1 ]
Schnieper, M [1 ]
Söchtig, J [1 ]
Thiele, H [1 ]
Westenhöfer, S [1 ]
机构
[1] CSEM, CH-8048 Zurich, Switzerland
关键词
replication; micro-optics; diffractive optics; optical microsystems;
D O I
10.1016/j.optlaseng.2004.02.007
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Replication technology is playing an increasingly important role in the production of optical microsystems and micro-optical elements. Hot embossing, injection moulding and UV-embossing all can produce high-quality optical elements in very cost-effective processes. New sol-gel materials allow the combination of replication with lithography to leave selected areas material-free for sawing and bonding. The development of wafer-scale replication technology using UV-curable sol-gel and polymer materials enables refractive and diffractive micro-optical elements as well as micro-mechanical alignment features to be replicated directly onto glass substrates or onto semiconductor device wafers. Grating nanostructures with linewidths less than 100 nm have been replicated into polymer and sol-gel materials for the cost-effective fabrication of large area subwavelength structures for applications such as polarisers and buried grating security features. (c) 2004 Elsevier Ltd. All rights reserved.
引用
收藏
页码:373 / 386
页数:14
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