Dually driven radio frequency plasma simulation with a three moment model

被引:32
作者
Kim, HC [1 ]
Manousiouthakis, VI [1 ]
机构
[1] Univ Calif Los Angeles, Dept Chem Engn, Los Angeles, CA 90095 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 04期
关键词
D O I
10.1116/1.581324
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This article presents simulation results of a dually excited capacitive rf plasma reactor. A self-consistent three moment model is employed which is shown to accurately capture the ion flux and energy at the substrate. Self-dc biases at the powered electrodes are also self-consistently determined by relating surface charges through Gauss' law. The simulation results of this rf triode system indicate that plasma density is predominantly determined by the primary electrode. Self-bias and ion bombardment energy at the secondary electrode both exhibit linear (logarithmic) dependency on the secondary rf power (frequency). This is qualitatively in good agreement with experimental results. (C) 1998 American Vacuum Society. [S0734-2101(98)08604-7].
引用
收藏
页码:2162 / 2172
页数:11
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