Electronic properties of nanostructures defined in Ga[Al]As heterostructures by local oxidation

被引:20
作者
Heinzel, T [1 ]
Held, R
Lüscher, S
Ensslin, K
Wegscheider, W
Bichler, M
机构
[1] Swiss Fed Inst Technol, Solid State Phys Lab, CH-8093 Zurich, Switzerland
[2] Univ Regensburg, Inst Angew & Expt Phys, D-93040 Regensburg, Germany
[3] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
关键词
Ga[Al]As; scanning probe lithography; quantum wires; conductance fluctuations;
D O I
10.1016/S1386-9477(00)00181-8
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Tunable nanostructures can be patterned in Ga[Al]As heterostructures with an atomic force microscope (AFM). Oxidizing the GaAs cap layer locally by applying a voltage to the AFM tip leads to depletion of the electron gas underneath the oxide. Here, we describe this type of AFM lithography as a tool to fabricate tunable nanostructures and characterize the electronic properties of the resulting confinement. As an example for the versatility of this technique, we present conductance measurements on a quantum wire as a function of its position. Conductance fluctuations in real space with a characteristic period of 2 nm are observed and interpreted in terms of individual peaks in the potential landscape the wire hits as it moves through the host crystal. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:84 / 93
页数:10
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