Micro-nanostructured interfaces fabricated by the use of inorganic block copolymer micellar monolayers as negative resist for electron-beam lithography

This paper introduces an approach where the match of two different length scales, ie., pattern from self-assembly of block copolymer micelles (<100 nm and electron-beam (e-beam writing (>50 nm), allow the grouping of nanometer-sized gold clusters in very small numbers in even aperiodic pattern and separation of these groups at length scales that are not accessible by pure self-assembly. Thus, we could demonstrate the grouping of Au nanoclusters in different geometries such as squares, rings, or spheres.