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Effect of nitrogen-ion implantation on the corrosion resistance of OT-4-0 titanium alloy in 0.9% NaCl environment
被引:19
作者:
Krupa, D
Baszkiewicz, J
Jezierska, E
Mizera, J
Wierzchon, T
Barcz, A
Fillit, R
机构:
[1] Warsaw Univ Technol, Dept Mat Sci & Engn, PL-02524 Warsaw, Poland
[2] Inst Electr Mat Technol, PL-02668 Warsaw, Poland
[3] Ecole Natl Super Mines, F-42023 St Etienne, France
关键词:
corrosion;
ion implantation;
nitrogen;
titanium;
transmission electron microscopy;
X-ray diffraction;
D O I:
10.1016/S0257-8972(98)00714-2
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
This work presents data on the properties of the surface layer of OT-4-0 titanium alloy after nitrogen-ion implantation. Polished samples were implanted with nitrogen doses of 1 x 10(16), 1 x 10(17), 6 x 10(17) and 1 x 10(18) N+ cm(-2). The corrosion resistance was examined by the electrochemical methods in 0.9% NaCl at a temperature of 37 degrees C. Structural examinations were made with a transmission electron microscope. Depth profiles of nitrogen were investigated by secondary-ion mass spectrometry. The phase composition of the implanted layers and the residual stresses induced in them during the implantation were examined by the X-ray diffraction method using a Dosophatex system. It was found that the increase of the corrosion resistance depends on the nitrogen dose employed; the maximum improvement of the corrosion resistance was observed with a dose of 1 x 10(17) N+ cm(-2) (C) 1999 Elsevier Science S.A. All rights reserved.
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页码:86 / 91
页数:6
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