Spectral fingerprinting of structural defects in plasma-treated carbon nanotubes

被引:55
作者
Chakrapani, N [1 ]
Curran, S
Wei, BQ
Ajayan, PM
Carrillo, A
Kane, RS
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Howard P Isermann Dept Chem & Biol Engn, Troy, NY 12180 USA
基金
美国国家科学基金会;
关键词
D O I
10.1557/JMR.2003.0350
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Controlled introduction of defects into aligned multiwalled carbon nanotubes (MWCNTs) was achieved by time-dependent plasma etching. The subsequent morphological changes in MWCNTs have been fingerprinted using Raman and x-ray photoelectron spectroscopy, by which induction of defects by functionalization was confirmed. We found that the introduction of defects along the nanotube body affects all Raman vibrational modes. A systematic analysis of the relationship between D, D' D*, and G modes leads us to believe that no one peak can be used as an accurate standard for estimation of defects in nanotubes.
引用
收藏
页码:2515 / 2521
页数:7
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