Optical recording using high numerical-aperture microlens by plasma etching

被引：14

作者：

Kouchiyama, A ^{[1
]}

Ichimura, I ^{[1
]}

Kishima, K ^{[1
]}

Nakao, T ^{[1
]}

Yamamoto, K ^{[1
]}

Hashimoto, G ^{[1
]}

Iida, A ^{[1
]}

Osato, K ^{[1
]}

机构：

[1] Sony Corp, Home Network Co, Giga Byte Lab, Shinagawa Ku, Tokyo 1410001, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2001年 / 40卷 / 3B期

关键词：

microlens; plasma etching; high numerical-aperture; optical recording;

D O I：

10.1143/JJAP.40.1792

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We propose the use of a high numerical-aperture (NA) microlens formed by plasma etching for an optical recording application. It was found through optical recording experiments that a microlens formed by plasma etching is applicable to a tiny objective tens.

引用

页码：1792 / 1793

页数：2

共 2 条

[1] Optical disk recording using a GaN blue-violet laser diode [J].

Ichimura, I ;

Maeda, F ;

Osato, K ;

Yamamoto, K ;

Kasami, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (2B) :937-942

[2] USEFULNESS OF MAGNETIC NEUTRAL LOOP DISCHARGE PLASMA IN PLASMA PROCESSING [J].

TSUBOI, H ;

ITOH, M ;

TANABE, M ;

HAYASHI, T ;

UCHIDA, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (5A) :2476-2481

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