Oxidation behaviour of TiAlN coatings sputtered at low temperature

被引：55

作者：

Panjan, P

Navinsek, B

Cekada, M

Zalar, A

机构：

[1] Jozef Stefan Inst, Ljubljana 1001, Slovenia

[2] Inst Surface Engn & Optoelect, Ljubljana 1001, Slovenia

来源：

VACUUM | 1999年 / 53卷 / 1-2期

关键词：

hard coatings; low temperature coatings; oxidation resistance; reactive sputter deposition;

D O I：

10.1016/S0042-207X(98)00407-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The basic mechanical and structural properties, as well as the oxidation behaviour of Ti1-xAlxN coatings sputtered at low temperature are reported. Ti1-xAlxN coatings of four different compositions were sputter deposited in a Sputron (Balzers) plasma-beam sputtering apparatus at a temperature below 200 degrees C. Polished tool steel discs, silicon wafers and polished alumina ceramics were used as substrates. Oxidation of coatings was carried out by heating the samples at temperatures of 700-900 degrees C in an oxygen atmosphere for selected times. The surface and fracture cross-sectional morphology of the as-deposited and oxidized films were studied by scanning electron microscopy, while the structure of the coatings was examined by the XRD and TEM techniques. (C) 1999 Elsevier Science Ltd. All rights reserved.

引用

页码：127 / 131

页数：5

共 7 条

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IKEDA T, 1991, THIN SOLID FILMS, V195, P99, DOI 10.1016/0040-6090(91)90262-V

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