Silicon nitride membrane substrates for the investigation of local structure in polymer thin films

被引:74
作者
Morkved, TL [1 ]
Lopes, WA [1 ]
Hahm, J [1 ]
Sibener, SJ [1 ]
Jaeger, HM [1 ]
机构
[1] Univ Chicago, James Franck Inst, Dept Chem, Chicago, IL 60637 USA
基金
美国国家科学基金会;
关键词
thin film morphology; silicon nitride membrane substrates; block copolymers;
D O I
10.1016/S0032-3861(97)10218-X
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The fabrication of silicon nitride membrane substrates and their use in studies of polymer thin films are described. As an integral part of a wafer, these membranes are both self-supporting and transparent for transmission electron microscopy (TEM). Therefore, the same polymer film can be spin-cast on the substrate and, without being removed, studied by a variety of techniques, including TEM, and atomic force microscopy (AFM). To demonstrate the utility of these substrates in characterizing both global and local film morphology, experimental results are presented on polystyrene-polymethylmethacrylate diblock copolymers in the ultrathin him limit, using optical microscopy together with combinations of AFM and TEM at the same location. The addition of microfabricated structures to these substrates, such as planar electrodes is also discussed. (C) 1998 Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:3871 / 3875
页数:5
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