Wettability modification of polysilicon for stiction reduction in silicon based micro-electromechanical structures

被引：4

作者：

Almanza-Workman, AM ^{[1
]}

Raghavan, S

Deymier, P

Monk, DJ

Roop, R

机构：

[1] Univ Arizona, Dept Mat Sci & Engn, Tucson, AZ 85721 USA

[2] Motorola Inc, Sensor Prod Div, Phoenix, AZ 85008 USA

来源：

ULTRA CLEAN PROCESSING OF SILICON SURFACES 2000 | 2001年 / 76-77卷

关键词：

polysilicon; self-assembled monolayers; stiction; water dispersible silanes;

D O I：

10.4028/www.scientific.net/SSP.76-77.23

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：23 / 26

页数：4

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