Moire pattern formation on porous alumina arrays using nanoimprint lithography

被引：39

作者：

Choi, JS ^{[1
]}

Wehrspohn, RB ^{[1
]}

Gösele, U ^{[1
]}

机构：

[1] Max Planck Inst Microstruct Phys, D-06120 Halle An Der Saale, Germany

来源：

ADVANCED MATERIALS | 2003年 / 15卷 / 18期

关键词：

D O I：

10.1002/adma.200305251

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Porous alumina arrays with various Moire patterns (see Figure) are prepared by two-step nanoindentation with different rotation angles and subsequent anodization. The patterns on the porous alumina array are in good agreement with the theory of Moire patterns in terms of the rotation angles. In addition, replicas of photoresist polymer with the Moire pattern are successfully prepared.

引用

页码：1531 / +

页数：5

共 25 条

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