Dip-coated Ru-Mo-O/Ti electrodes for electrochemical capacitors
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作者:
Takasu, Y
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
Takasu, Y
[1
]
Nakamura, T
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
Nakamura, T
[1
]
Murakami, Y
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Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, JapanShinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
Murakami, Y
[1
]
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[1] Shinshu Univ, Fac Text Sci & Technol, Dept Fine Mat Engn, Ueda, Nagano 3868567, Japan
RuO2-MoO3/Ti electrodes prepared by a dip-coating method provide an extremely large pseudocapacitance showing that they have a potential for use as electrochemical capacitors. The highest pseudocapacitance was 208 F g(-1) for RuO2(50)-MoO3(50)/Ti. The voltammetric charge of this electrode, 166 C g(-1) between 0.3 and 1.1 V (vs. RHE), corresponds to 0.48 protons contributed to the adsorption and desorption on every loaded ruthenium, if the probable contribution of molybdenum to the pseudocapacitance was neglected.
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Army Res Lab, Sensors & Electron Devices Directorate, Adelphi, MD 20783 USAArmy Res Lab, Sensors & Electron Devices Directorate, Adelphi, MD 20783 USA
Jow, TR
Zheng, JP
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Army Res Lab, Sensors & Electron Devices Directorate, Adelphi, MD 20783 USAArmy Res Lab, Sensors & Electron Devices Directorate, Adelphi, MD 20783 USA
机构:
Army Res Lab, Sensors & Electron Devices Directorate, Adelphi, MD 20783 USAArmy Res Lab, Sensors & Electron Devices Directorate, Adelphi, MD 20783 USA
Jow, TR
Zheng, JP
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Army Res Lab, Sensors & Electron Devices Directorate, Adelphi, MD 20783 USAArmy Res Lab, Sensors & Electron Devices Directorate, Adelphi, MD 20783 USA