Dynamical characterization of one-dimensional stationary growth regimes in diffusion-limited electrodeposition processes

被引：45

作者：

Léger, C ^{[1
]}

Elezgaray, J ^{[1
]}

Argoul, F ^{[1
]}

机构：

[1] Ctr Rech Paul Pascal, F-33600 Pessac, France

来源：

PHYSICAL REVIEW E | 1998年 / 58卷 / 06期

关键词：

D O I：

10.1103/PhysRevE.58.7700

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The occurrence of stationary growth regimes in thin gap electrodeposition experiments is discussed in terms of diffusion-limited dynamics and confirmed by a quantitative interferometric analysis of concentration fields during copper electrodeposition in 50-mu m cells, with unsupported electrolytes. We develop a 1D model for the time evolution of the averaged concentration profile after Sand's time and we check its predictions during the transitory and asymptotic growth regimes in electrodeposition experiments. [S1063-651X(98)15112-7].

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页码：7700 / 7709

页数：10

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