Heavy-ion induced damage of crystalline Ge and W in the 0.5-8 A MeV range

被引:13
作者
Huber, H
Assmann, W
Karamian, SA [1 ]
Mieskes, HD
Nolte, H
Gazis, E
Kokkoris, M
Kossionides, S
Vlastou, R
Grötzschel, R
Mücklich, A
Prusseit, W
机构
[1] Joint Inst Nucl Res, FLNR, Dubna 141980, Moscow Regio, Russia
[2] Univ Munich, Sekt Phys, D-85748 Garching, Germany
[3] Natl Tech Univ Athens, Dept Phys, Athens 15780, Greece
[4] Democritos Natl Res Ctr Phys Sci, Inst Nucl Phys, GR-15310 Athens, Greece
[5] Rossendorf Inc, Forschungszentrum Rossendorf EV, Inst Ionenphys & Mat Forschung, D-01314 Dresden, Germany
[6] Tech Univ Munich, Dept Phys E10, D-85747 Garching, Germany
关键词
swift heavy ions; crystals; damage; channeling;
D O I
10.1016/S0168-583X(98)00514-X
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
High energy heavy-ion induced damage of Ge and W crystals was studied by blocking and channeling. Beams of ions from C to Au with energies from 12 to 266 MeV were used both for damaging the crystal and for "in-situ" measurement of lattice disordering. The blocking minimum yield and angular half-width have been measured as a function of dose, and it is shown that the relative ion damaging efficiency for Ge decreases at high electronic energy-loss values. The mechanism of microannealing along the ion path is discussed. The saturation and dose-rate dependence of damage are explained in terms of defect mobility and recombination processes. For a W crystal the initial damaging power is proportional to the number of displacements predicted by TRIM and a disorder saturation is observed at high doses. (C) 1498 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:309 / 316
页数:8
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