Preparation of ceria thin films and microtubes by vapor-phase deposition using NiO as oxygen source

被引：7

作者：

Inaba, M ^{[1
]}

Mineshige, A

Nakanishi, S

Nishimura, I

Tasaka, A

Kikuchi, K

Ogumi, Z

机构：

[1] Kyoto Univ, Grad Sch Engn, Dept Energy & Hydrocarbon Chem, Sakyo Ku, Kyoto 60601, Japan

[2] Doshisha Univ, Fac Engn, Dept Mol Sci & Technol, Kyoto 61003, Japan

[3] Univ Shiga Prefecture, Dept Mat Sci, Shiga 522, Japan

来源：

THIN SOLID FILMS | 1998年 / 323卷 / 1-2期

关键词：

electrochemical vapor deposition; ceria; thin film; microtube; nickel oxide;

D O I：

10.1016/S0040-6090(97)00927-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A modified version of electrochemical vapor deposition (EVD) using NiO as an oxygen source was applied to the fabrication of CeO2 thin films and microtubes. Cerium trichloride was used as a metal source, and NiO pellets and surface-oxidized Ni wires of 125 mu m diameter as substrates for deposition. Thin films of cubic CeO2 were formed on both substrates by the vapor-phase reaction at 900 and 950 degrees C. Furthermore, ceria microtubes of 130 mu m diameter were obtained by soaking the ceria-coated Ni wires in hydrochloric acid. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：18 / 22

页数：5

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