Fabrication and characterization of electrostatically driven silicon microbeams

被引:10
作者
Attia, P [1 ]
Boutry, M [1 ]
Bosseboeuf, A [1 ]
Hesto, P [1 ]
机构
[1] Univ Paris 11, Inst Elect Fondamentale, CNRS URA 022, F-91405 Orsay, France
关键词
micromechanical silicon device; RIE etching; electrostatic actuation;
D O I
10.1016/S0026-2692(98)00028-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Free standing single-crystal silicon cantilever beams were fabricated by a SCREAM-like process which uses dry etching. Typical dimensions are length 200 mu m, width 2-3 mu m, thickness 2-3 mu m. Cantilever beams were initially upward deflected by depositing a tungsten layer with a tensile stress. The electrostatic vertical actuation of the composite beam is investigated by biasing it with respect to the grounded substrate and lateral driving electrodes. A voltage of 10 V is sufficient to induce a large displacement of the beam free end up to 8 mu m. A precise positioning is obtained with a good repeatability. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:641 / 644
页数:4
相关论文
共 8 条
[1]  
BOUTRY M, UNPUB J VAC SCI TEC
[2]  
JANSEN H, 1995, MICROMECHANICS EUROP, P18
[3]   W/SI SCHOTTKY DIODES - EFFECT OF SPUTTERING DEPOSITION CONDITIONS ON THE BARRIER HEIGHT [J].
MAMOR, M ;
DUFOURGERGAM, E ;
FINKMAN, L ;
TREMBLAY, G ;
MEYER, F ;
BOUZIANE, K .
APPLIED SURFACE SCIENCE, 1995, 91 (1-4) :342-346
[4]   MECHANISM OF SURFACE CHARGING EFFECTS ON ETCHING PROFILE DEFECTS [J].
MURAKAWA, S ;
MCVITTIE, JP .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (4B) :2184-2188
[5]  
ROY S, 1995, MICRO ELECTRO MECHANICAL SYSTEMS - IEEE PROCEEDINGS, 1995, P353, DOI 10.1109/MEMSYS.1995.472595
[6]  
SHAW KA, P IEEE MEMS 93, P155
[7]  
Tang W. C., 1992, Journal of Microelectromechanical Systems, V1, P170, DOI 10.1109/JMEMS.1992.752508
[8]  
YAO JJ, 1995, TRANSDUCERS 95, P384