Contribution of UV light to the decomposition of toluene in dielectric barrier discharge plasma/photocatalysis system

被引：64

作者：

Huang, Hai Bao ^{[1
]}

Ye, Dai Qi ^{[1
]}

Fu, Ming Li ^{[1
]}

Da Feng, Fa ^{[1
]}

机构：

[1] S China Univ Technol, Coll Environm Sci & Engn, Guangzhou 510640, Peoples R China

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 2007年 / 27卷 / 05期

关键词：

dielectric barrier discharge; UV light; photocatalysis; plasma; toluene;

D O I：

10.1007/s11090-007-9085-z

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

The contribution of UV light from plasma and an external UV lamp to the decomposition of toluene in a dielectric barrier discharge (DBD) plasma/UV system, as well as in a plasma/photocatalysis system was investigated. It was found that UV light from the DBD reactor was very weak. Its contribution to the removal of toluene in the plasma/photocatalysis system could be ignored. Whereas, the introduction of external UV light to the plasma significantly improves the removal efficiency of toluene by 20%. The removal efficiency of toluene in the plasma/photocatalysis system increased about 22% and 16% when compared with a plasma only system and plasma driven photocatalyst system, respectively. The increased toluene removal efficiency was mostly attributed to the contribution of the synergy between plasma and UV light, but not to the synergy between plasma and photocatalysis. The synergetic effect between plasma and photocatalysis was not significant.

引用

页码：577 / 588

页数：12

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