Characteristics of the Ti2N layer produced by an ion assisted deposition method

被引：42

作者：

Ruset, C

Grigore, E

Collins, GA

Short, KT

Rossi, F

Gibson, N

Dong, H

Bell, T

机构：

[1] Natl Inst Laser Plasma & Radiat Phys, Bucharest, Romania

[2] Australian Nucl Sci & Technol Org, Menai, NSW 2234, Australia

[3] Commiss European Communities, Joint Res Ctr, Inst Hlth & Consumer Protect, I-21020 Ispra, VA, Italy

[4] Univ Birmingham, Sch Engn, Dept Met & Mat, Birmingham B15 2TT, W Midlands, England

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 174卷

关键词：

magnetron sputtering; ion implantation; instrumented indentation; stress analysis; wear;

D O I：

10.1016/S0257-8972(03)00411-0

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

An ion assisted deposition process (CMSII) has been developed by combining high-energy ion bombardment, produced by a high voltage pulse discharge, with conventional magnetron sputtering. Since the ion bombardment occurs simultaneously with deposition, the implanted ions are uniformly distributed within the coating. Hard Ti2N layers with an extremely dense, featureless structure and a thickness up to 50 mum have been produced. Instrumented indentation, XRD, SEM, GDOS have been used to characterize these layers, deposited on various substrates. Wear tests have been carried out in order to assess the tribological properties of this type of coating, in comparison with other surface layers. (C) 2003 Elsevier Science B.V All rights reserved.

引用

页码：698 / 703

页数：6

共 4 条

[1] From plasma immersion ion implantation to deposition: a historical perspective on principles and trends [J].