The influence of ion implantation on the properties of titanium nitride layer deposited by magnetron sputtering

被引：43

作者：

Ruset, C ^{[1
]}

Grigore, E ^{[1
]}

机构：

[1] Natl Inst Laser Plasma & Radiat Phys, Bucharest, Romania

来源：

SURFACE & COATINGS TECHNOLOGY | 2002年 / 156卷 / 1-3期

关键词：

super-hard layers; magnetron sputtering; ion implantation; glow discharge spectrometry;

D O I：

10.1016/S0257-8972(02)00121-4

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A new deposition method, by combining standard magnetron sputtering and ion implantation, has been developed. Some characteristics of the layers produced by this method have been investigated in comparison with the standard TiN coating obtained by conventional magnetron sputtering. The new coatings have a hardness of similar to5000 HV0.04, a thickness up 15 mum and a structure close to Ti2N. The width of the layer-substrate interface is significantly larger than usual and this ensures very good adhesion. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：159 / 161

页数：3

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