Chromium ion implantation for inhibition of corrosion of aluminium

被引:12
作者
Rangel, CM
Paiva, TIC
机构
[1] Inst. Nac. Engenharia Tecn. Indust., IMP/DM, Electrochemistry of Materials, 1699 Lisboa Codex
关键词
ion implantation; fitting corrosion; aluminium; chromium; passive films;
D O I
10.1016/0257-8972(95)02822-6
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effect of chromium implantation into pure aluminium targets on the corrosion behaviour of the superficial alloys produced was studied in aqueous carbonate-bicarbonate solutions containing chloride ions. A beam energy of 150 keV was used for implantation of chromium into aluminium with doses varying from 5 x 10(16) to 2 x 10(17) ions cm(-2). Ennoblement of pitting potentials, obtained when using a scan rate of 0.08 mV s(-1), was observed for all concentrations used. A maximum in pitting resistance was found around 8 at.% Cr. For samples with peak chromium concentrations in excess of about 8 at.%, the values of pitting potential remained almost constant. The maximum was also observed when studying chromium implanted into steel. The changes in chemistry of the passive film on chromium-implanted aluminium alloys, at breakdown potentials, were studied using X-ray photoelectron spectroscopy (XPS). The Cr3+ state corresponded to the chromium oxyhydroxide phase. Cr(IV) and Cr(VI) were also detected. A chromium concentration in excess of approximately 8 at.% made pit repassivation difficult. This might be due to a more effective hydrolysis of chromium ions regarding aluminium ions, which maintains the critical pit environment at lower potential and current density.
引用
收藏
页码:194 / 200
页数:7
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