ION-IMPLANTATION FOR CORROSION INHIBITION OF ALUMINUM-ALLOYS IN SALINE MEDIA

被引：22

作者：

WILLIAMS, JM

GONZALES, A

QUINTANA, J

LEE, IS

BUCHANAN, RA

BURNS, FC

CULBERTSON, RJ

LEVY, M

TREGLIO, JR

机构：

[1] AVSCOM,DERSO,CORPUS CHRISTI,TX

[2] CORPUS CHRISTI ARMY DEPOT,CORPUS CHRISTI,TX

[3] UNIV TENNESSEE,KNOXVILLE,TN 37996

[4] USA,MAT TECHNOL LAB,WATERTOWN,MA 02172

[5] ISM TECHNOL INC,SAN DIEGO,CA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1991年 / 59卷

关键词：

D O I：

10.1016/0168-583X(91)95717-R

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The effects of ion implantation treatments on corrosion of 2014 and 1100 aluminum in saline media were investigated. Implanted constituents were N, Si, Ti, and Cr. Techniques included salt spray testing, electrochemical studies, Rutherford backscattering spectrometry, and profilometry. The principal conclusion was that ion implantation of Cr is of potential practical benefit for corrosion inhibition of 2014 Al in salt environments.

引用

页码：845 / 850

页数：6

共 5 条

[1] COMPOUND FORMATION EFFECTS IN COMPUTING IMPLANTATION PROFILES [J].