Influence of the elastic strain on the band structure of ellipsoidal SiGe coherently embedded in the Si matrix

被引:18
作者
Usami, N
Ichitsubo, T
Ujihara, T
Takahashi, T
Fujiwara, K
Sazaki, G
Nakajima, K
机构
[1] Tohoku Univ, Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan
[2] Osaka Univ, Grad Sch Engn Sci, Osaka 5608531, Japan
关键词
D O I
10.1063/1.1580194
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on a theoretical investigation of the elastic strain in an ellipsoidal SiGe inclusion coherently embedded in Si and its influence on the band structure of SiGe. The strain was calculated as a function of the Ge fraction in SiGe and the aspect ratio of the ellipsoid, and utilized to derive the shift of the band edge. When the principal axis of the ellipsoid was chosen to be parallel to [001], the band structure of SiGe was predicted to be Si like regardless of the aspect ratio. The band gap of strained SiGe was also calculated, and the deviation of the aspect ratio from unity was found to be effective to decrease the band gap due to the breaking of the crystal symmetry. These results suggest the importance of controlling strain, shape, and local Ge fraction in multicrystalline SiGe, which we propose as a promising material for solar cell applications. (C) 2003 American Institute of Physics.
引用
收藏
页码:916 / 920
页数:5
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