Stability of the nitrogen-deficient Ti2AlN x MAX phase in Ar2+-irradiated (Ti,Al)N/Ti2AlN x multilayers

被引：38

作者：

Bugnet, M. ^{[1
]}

Cabioc'h, T. ^{[1
]}

Mauchamp, V. ^{[1
]}

Guerin, Ph. ^{[1
]}

Marteau, M. ^{[1
]}

Jaouen, M. ^{[1
]}

机构：

[1] Univ Poitiers, ENSMA, UPR 3346, CNRS,Inst Pprime,Dept Phys & Mecan Mat, F-96962 Futuroscope, France

来源：

JOURNAL OF MATERIALS SCIENCE | 2010年 / 45卷 / 20期

关键词：

M(N+1)AX(N) PHASES; ION; DEPOSITION; STRESS; FILMS;

D O I：

10.1007/s10853-010-4615-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effects of 100 keV Ar2+ ion irradiation on the structure and stability of multilayered dc sputtered and annealed thin films of (Ti,Al)N/Ti2AlN (x) have been investigated with X-ray diffraction and transmission electron microscopy. It is shown that the multilayer structure is preserved as well as the crystalline structures of both components. This demonstrates a high tolerance of the Ti2AlN (x) MAX phase in multilayers to damage induced by nuclear elastic interactions. It is suggested that damage recovery may originate from native nitrogen vacancies and from the interfaces that act as sinks for point defects, like Frenkel pairs, created during the irradiation.

引用

页码：5547 / 5552

页数：6

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