Strain dependence of the magnetic properties of nm Fe films on W(100)

被引:40
作者
Enders, A [1 ]
Sander, D [1 ]
Kirschner, J [1 ]
机构
[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany
关键词
D O I
10.1063/1.369854
中图分类号
O59 [应用物理学];
学科分类号
摘要
The magnetoelastic coupling B1, intrinsic film stress and magnetic in-plane anisotropy of Fe films on W(100) were examined by Kerr magnetooptical effect measurements as a function of film thickness. The thickness-dependent deviation of K4 from the Fe bulk value is tentatively ascribed to the lattice distortions due to an effective in-plane strain.
引用
收藏
页码:5279 / 5281
页数:3
相关论文
共 15 条
[1]   SURFACE MAGNETOELASTIC COUPLING-COEFFICIENTS OF SINGLE-CRYSTAL FCC CO THIN-FILMS [J].
BOCHI, G ;
SONG, O ;
OHANDLEY, RC .
PHYSICAL REVIEW B, 1994, 50 (03) :2043-2046
[2]   Higher-order magnetic anisotropies and the nature of the spin-reorientation transition in face-centered-tetragonal Ni(001)/Cu(001) [J].
Farle, M ;
MirwaldSchulz, B ;
Anisimov, AN ;
Platow, W ;
Baberschke, K .
PHYSICAL REVIEW B, 1997, 55 (06) :3708-3715
[3]   STRUCTURAL AND MAGNETIC CHARACTERIZATION OF THIN IRON FILMS ON A TUNGSTEN (001) SUBSTRATE [J].
JONES, TL ;
VENUS, D .
SURFACE SCIENCE, 1994, 302 (1-2) :126-140
[4]   PHYSICAL THEORY OF FERROMAGNETIC DOMAINS [J].
KITTEL, C .
REVIEWS OF MODERN PHYSICS, 1949, 21 (04) :541-583
[5]   Magnetoelastic coupling of Fe at high stress investigated by means of epitaxial Fe(001) films [J].
Koch, R ;
Weber, M ;
Thurmer, K ;
Rieder, KH .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1996, 159 (1-2) :L11-L16
[6]   THICKNESS AND POLARIZATION DEPENDENCE OF THE MAGNETO-OPTIC SIGNAL FROM ULTRATHIN FERROMAGNETIC-FILMS [J].
MOOG, ER ;
LIU, C ;
BADER, SD ;
ZAK, J .
PHYSICAL REVIEW B, 1989, 39 (10) :6949-6956
[7]   DETERMINING THIN-FILM MAGNETOELASTIC CONSTANTS [J].
OHANDLEY, RC ;
SONG, OS ;
BALLENTINE, CA .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (10) :6302-6307
[8]   Anisotropic surface stress on W(110) [J].
Sander, D ;
Enders, A ;
Kirschner, J .
EUROPHYSICS LETTERS, 1999, 45 (02) :208-214
[9]   A SIMPLE TECHNIQUE TO MEASURE STRESS IN ULTRATHIN FILMS DURING GROWTH [J].
SANDER, D ;
ENDERS, A ;
KIRSCHNER, J .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1995, 66 (09) :4734-4735
[10]   Stress and structure of Ni monolayers on W(110): The importance of lattice mismatch [J].
Sander, D ;
Schmidthals, C ;
Enders, A ;
Kirschner, J .
PHYSICAL REVIEW B, 1998, 57 (03) :1406-1409