Effect of fabrication errors in channel waveguide Bragg gratings

被引：19

作者：

Coppola, G

Irace, A

Cutolo, A

Iodice, M

机构：

[1] Univ Naples Federico II, Dept Elect Engn, I-80125 Naples, Italy

[2] CNR, Ist Ric Electtromagnetismo & Componenti Elettron, I-80124 Naples, Italy

来源：

APPLIED OPTICS | 1999年 / 38卷 / 09期

关键词：

D O I：

10.1364/AO.38.001752

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The spectral performances of nonideal rectangular Bragg gratings, integrated in a rib waveguide, are analyzed by a multilayer approach based on the effective-index method. The effects of errors on the photolithographic definition of the grating, that is, period and shape, and of errors on the central of etching depth are investigated. Also the influence of the stitching error, which is unavoidable when the grating is realized by means of electron-beam photolithography, is addressed. A novel analytical approach that extends coupled-mode theory to the analysis of real gratings is also presented. (C) 1999 Optical Society of America.

引用

收藏

页码：1752 / 1758

页数：7

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