Preparation of multilayered Co/Pd nanostructure films by electroplating and their magnetic properties

被引:11
作者
Kudo, K [1 ]
Kobayakawa, K [1 ]
Sato, Y [1 ]
机构
[1] Kanagawa Univ, Fac Engn, Dept Appl Chem, Kanagawa Ku, Yokohama, Kanagawa 2218686, Japan
关键词
multilayered film; electroplating; nanostructure; cobalt-palladium; remanent perpendicular magnetization;
D O I
10.1016/S0013-4686(01)00585-0
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Multilayered fcc Co/Pd nanostructure films, prepared by electrodeposition on an electropolished polycrystalline copper substrate using a dual cell method, exhibit a remanent perpendicular magnetic anisotropy which depends on the Co film thickness. By decreasing the Co layer thickness and setting the Pd monolayer thickness as I nm, the remanent magnetic ratio (the ratio of the remanent magnetization perpendicular to the film plane in relation to that found on the plane of the film) became large and exceeded I for a Co layer thickness of about 0.4 nm, which indicates that the easy axis of magnetization of the multilayered film changed from a direction parallel to the film plane to a direction perpendicular to it at this Co film thickness. The magnetic behavior of the heat treated Co/Pd multilayered film was measured and discussed. (C) 2001 Published by Elsevier Science Ltd.
引用
收藏
页码:353 / 357
页数:5
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