Metastable impact electron spectroscopy (MIES) study of chemical vapour deposited (CVD) diamond films

被引：18

作者：

Dieckhoff, S

Ochs, D

Günster, J

Kempter, V

机构：

[1] Tech Univ Clausthal, Inst Phys, D-38678 Clausthal Zellerfeld, Germany

[2] Fraunhofer Inst Angew Mat Forsch, D-28717 Bremen, Germany

来源：

SURFACE SCIENCE | 1999年 / 423卷 / 01期

关键词：

CVD; diamond films; metastable impact electron spectroscopy (MIES); valence band spectra;

D O I：

10.1016/S0039-6028(98)00894-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

As-grown chemical vapour deposited diamond films are characterized by scanning electron microscopy and XPS core level spectroscopy. Metastable impact electron spectroscopy is applied to get information on the electronic structure of the valence band of the films studied. The results are compared with valence band spectra obtained with high-resolution-XPS, UPS (He I and II) under the same conditions and with recent ab initio calculations for the layer-resolved density of states. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：53 / 60

页数：8

共 27 条

[1]

[Anonymous], SPRINGER SERIES SURF

[2] Characterization of triazine derivatives on silicon wafers studied by photoelectron spectroscopy (XPS, UPS) and metastable impact electron spectroscopy (MIES) [J].