Surface tension and surface roughness of supported polystyrene films

被引：23

作者：

Lurio, L ^{[1
]}

Kim, H

Rühm, A

Basu, J

Lal, J

Sinha, S

Mochrie, SGJ

机构：

[1] No Illinois Univ, Dept Phys, De Kalb, IL 60115 USA

[2] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA

[3] Univ Calif San Diego, Dept Phys, La Jolla, CA 92093 USA

[4] Sogang Univ, Dept Phys, Seoul 121724, South Korea

[5] MIT, Ctr Mat Sci & Engn, Cambridge, MA 02139 USA

[6] Univ Illinois, Mat Res Lab, Urbana, IL 61801 USA

[7] Argonne Natl Lab, IPNS, Argonne, IL 60439 USA

[8] Yale Univ, Dept Phys, New Haven, CT 06520 USA

来源：

MACROMOLECULES | 2003年 / 36卷 / 15期

关键词：

D O I：

10.1021/ma034189l

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Surface-diffuse X-ray scattering has been measured from a series of polystyrene (PS) films supported on oxide-terminated Si substrates. Films of thicknesses ranging from 84 to 359 nm were investigated over a temperature range from 120 to 180 degreesC, all above the bulk PS glass transition temperature. The surface tension was extracted from the absolute intensity of diffuse scattering. The values show a slight excess of the surface tension (similar to20%) over the bulk material. Capillary wave theory is used to describe the observed diffuse scattering down to in-plane length scales of 2 nm, the limit of our resolution. The total surface roughness exceeds the value that would be expected from capillary wave theory, indicating the presence of excess roughness at length scales less than 2 nm.

引用

页码：5704 / 5709

页数：6

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