Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films

被引：21

作者：

Lungu, CP ^{[1
]}

Futsuhara, M

Takai, O

Braic, M

Musa, G

机构：

[1] Nagoya Univ, Dept Mat Proc Engn, Nagoya, Aichi 464, Japan

[2] Natl Inst Phys Lasers Plasma & Radiat, Bucharest, Romania

[3] Nippon Paint Co Ltd, Paint Design Inst, Tokyo 140, Japan

[4] Natl Inst Optoelect, Bucharest, Romania

来源：

VACUUM | 1998年 / 51卷 / 04期

关键词：

D O I：

10.1016/S0042-207X(98)00264-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The noble gases' (Ar, He and Ne) influence on the TiN deposition by reactive radio frequency (rf) magnetron sputtering have been studied. Effects of the interelectrode distance and the discharge power were also taken into account The optical diagnostics of plasma was carried out The characteristics of Ti emission (395.82 nm) from titanium atoms and N-2(+) emission (391.44 nm) of the first negative system were investigated in detail. Ti (395.82 nm)/Ni-2(+) (391.44 nm) intensity ratio between Ti/N-2 emission was correlated with the deposition rate of the films. The enhancement of the TiN (111) peak intensity in the neon or helium presence in the ternary gas mixtures (Ar + N-2 + Ne), (Ar + N-2 + He) was emphasized. (C) 1998 Elsevier Science Ltd. All rights reserved.

引用

页码：635 / 640

页数：6

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