CHARACTERIZATION OF TITANIUM NITRIDE THIN-FILMS

被引：104

作者：

WU, HZ ^{[1
]}

CHOU, TC ^{[1
]}

MISHRA, A ^{[1
]}

ANDERSON, DR ^{[1
]}

LAMPERT, JK ^{[1
]}

GUJRATHI, SC ^{[1
]}

机构：

[1] UNIV MONTREAL,DEPT PHYS,PHYS NUCL LAB,CP 6128,SUCCURSALE A,MONTREAL H3C 3J7,QUEBEC,CANADA

来源：

THIN SOLID FILMS | 1990年 / 191卷 / 01期

关键词：

D O I：

10.1016/0040-6090(90)90274-H

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

TiN thin films were deposited by r.f. reactive sputtering. The as-deposited films and films heat treated at 300, 400 and 550 °C an air and N2 were analyzed by different techniques, i.e. scanning electron microscopy, transmission electron microscopy, thin film X-ray diffraction (Seemann-Bohlin diffractometer), secondary ion mass spectroscopy, X-ray photoelectron spectroscopy, Rutherford backscattering spectroscopy, and elastic recoil detection. The results obtained were used to discuss the capabilities, advantages and limitations of the above-mentioned techniques. © 1990.

引用

页码：55 / 67

页数：13

共 13 条

[1] CHARACTERIZATION OF TITANIUM NITRIDE FILMS SPUTTER DEPOSITED FROM A HIGH-PURITY TITANIUM NITRIDE TARGET [J].

BRAT, T ;

PARIKH, N ;

TSAI, NS ;

SINHA, AK ;

POOLE, J ;

WICKERSHAM, C .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06) :1741-1747

[2] A CORRELATION OF AUGER-ELECTRON SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY, AND RUTHERFORD BACKSCATTERING SPECTROMETRY MEASUREMENTS ON SPUTTER-DEPOSITED TITANIUM NITRIDE THIN-FILMS [J].

BURROW, BJ ;

MORGAN, AE ;

ELLWANGER, RC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2463-2469

[3]

FEDER R, 1969, IBM RC2371 RES REP

[4] CHARACTERIZATION OF HARD NITRIDE AND CARBIDE TITANIUM AND ZIRCONIUM COATINGS ON HIGH-SPEED STEEL CUTTING-TOOL INSERTS [J].

FENSKE, G ;

KAUFHERR, N ;

ALBERTSON, C ;

MAPALO, G ;

NIELSEN, R ;

KAMINSKY, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2879-2884

[5] NONDESTRUCTIVE SURFACE-ANALYSIS BY NUCLEAR-SCATTERING TECHNIQUES [J].

GUJRATHI, SC ;

AUBRY, P ;

LEMAY, L ;

MARTIN, JP .

CANADIAN JOURNAL OF PHYSICS, 1987, 65 (08) :950-955

[6]

KANOMORI S, 1986, THIN SOLID FILMS, V136, P195

[7] USE OF LI-6 AND CL-35 ION-BEAMS IN SURFACE ANALYSIS [J].

LECUYER, J ;

BRASSARD, C ;

CARDINAL, C ;

TERREAULT, B .

NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3) :271-277

[8] DETAILED CHARACTERIZATION OF TIC AND TIN COATINGS PREPARED BY THE ACTIVATED REACTIVE EVAPORATION PROCESS [J].

LIN, P ;

DESHPANDEY, C ;

DOERR, HJ ;

BUNSHAH, RF ;

KAUFHERR, N ;

NIELSEN, R ;

FENSKE, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2732-2736

[9]

MCHUGH JA, 1975, METHODS SURFACE ANAL, P248

[10] THE CHEMICAL-ANALYSIS OF TIN FILMS - A ROUND-ROBIN EXPERIMENT [J].

PERRY, AJ ;

STRANDBERG, C ;

SPROUL, WD ;

HOFMANN, S ;

ERNSBERGER, C ;

NICKERSON, J ;

CHOLLET, L .

THIN SOLID FILMS, 1987, 153 :169-183

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