A CORRELATION OF AUGER-ELECTRON SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY, AND RUTHERFORD BACKSCATTERING SPECTROMETRY MEASUREMENTS ON SPUTTER-DEPOSITED TITANIUM NITRIDE THIN-FILMS

被引：123

作者：

BURROW, BJ

MORGAN, AE

ELLWANGER, RC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 06期

关键词：

D O I：

10.1116/1.574092

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2463 / 2469

页数：7

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