CHARACTERIZATION OF TITANIUM NITRIDE FILMS SPUTTER DEPOSITED FROM A HIGH-PURITY TITANIUM NITRIDE TARGET

被引：44

作者：

BRAT, T

PARIKH, N

TSAI, NS

SINHA, AK

POOLE, J

WICKERSHAM, C

机构：

[1] UNIV N CAROLINA, CHAPEL HILL, NC 27514 USA

[2] AT&T BELL LABS, ALLENTOWN, PA 18103 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 06期

关键词：

D O I：

10.1116/1.583630

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1741 / 1747

页数：7

共 52 条

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