Thermal stability of self-assembled octadecyltrichlorosilane monolayers on planar and curved silica surfaces

被引:54
作者
Kulkarni, SA
Mirji, SA
Mandale, AB
Vijayamohanan, KP [1 ]
机构
[1] Natl Chem Lab, Div Phys Chem, Pune 411008, Maharashtra, India
[2] Natl Chem Lab, Ctr Mat Characterizat, Pune 411008, Maharashtra, India
关键词
self-assembled monolayers (SAMs); octadecyltrichlorosilane (OTS); scanning electron microscopy (SEM); Fourier transform infrared (FTIR) spectroscopy;
D O I
10.1016/j.tsf.2005.08.321
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Understanding the structural and functional integrity of self-assembled monolayers (SAMs) of alkytrichlorosilane on Si/SiO2, interface with change in temperature is critical for realizing their utility as antistiction coatings during the fabrication and functioning of microelectromechanical systems. Here we describe the thermal stability of two dimensional (2D) octadecyltrichlorosilane (OTS) monolayers on both n-type Si substrate (planar surface) and silica spheres (curved surface) using results of various surface sensitive spectroscopic techniques like the grazing angle Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy. Densely packed OTS monolayer on n-type Si surface is found to be thermally stable up to 525 K, while a significant enhancement in the thermal stability is interestingly observed for the case of OTS SAM (up to 625 K) on freshly prepared spherical silica surfaces. Despite this difference in the thermal stability, the results of temperature dependent infrared spectra demonstrate monolayer decomposition in both cases through the involvement of both Si-C and C-C bonds leaving Si-O-Si bond intact. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:420 / 425
页数:6
相关论文
共 30 条
[1]   Wafer level anti-stiction coatings for MEMS [J].
Ashurst, WR ;
Carraro, C ;
Maboudian, R ;
Frey, W .
SENSORS AND ACTUATORS A-PHYSICAL, 2003, 104 (03) :213-221
[2]   PREPARATION AND CHROMATOGRAPHIC USES OF SURFACE-BONDED SILICONES [J].
AUE, WA ;
HASTINGS, CR .
JOURNAL OF CHROMATOGRAPHY, 1969, 42 (03) :319-&
[3]  
Bellamy L.J., 1968, ADV INFRARED GROUP F
[4]   GROWTH OF SELF-ASSEMBLED N-ALKYLTRICHLOROSILANE FILMS ON SI(100) INVESTIGATED BY ATOMIC-FORCE MICROSCOPY [J].
BIERBAUM, K ;
GRUNZE, M ;
BASKI, AA ;
CHI, LF ;
SCHREPP, W ;
FUCHS, H .
LANGMUIR, 1995, 11 (06) :2143-2150
[5]   SILANIZATION OF SOLID SUBSTRATES - A STEP TOWARD REPRODUCIBILITY [J].
BRZOSKA, JB ;
BENAZOUZ, I ;
RONDELEZ, F .
LANGMUIR, 1994, 10 (11) :4367-4373
[6]   Thermal stability of self-assembled monolayers from alkylchlorosilanes [J].
CalistriYeh, M ;
Kramer, EJ ;
Sharma, R ;
Zhao, W ;
Rafailovich, MH ;
Sokolov, J ;
Brock, JD .
LANGMUIR, 1996, 12 (11) :2747-2755
[7]  
Colthup N.B., 1990, INTRO INFRARED RAMAN
[8]  
GALAMBOS P, 2001, ENCY MAT SCI TECHNOL, P5598
[9]   Infrared spectroscopy of three-dimensional self-assembled monolayers: N-alkanethiolate monolayers on gold cluster compounds [J].
Hostetler, MJ ;
Stokes, JJ ;
Murray, RW .
LANGMUIR, 1996, 12 (15) :3604-3612
[10]  
KULTH GJ, 1997, LANGMUIR, V17, P3775