Chaloogenide memory arrays: Characterization and radiation effects

被引:61
作者
Maimon, JD
Hunt, KK
Burcin, L
Rodgers, J
机构
[1] Vanderbilt Univ, Elect & Comp Engn Dept, Nashville, TN 37235 USA
[2] BAE Syst, Manassas, VA USA
关键词
chalcogenide; memory; nonvolatile; phase change; single event; total dose;
D O I
10.1109/TNS.2003.821377
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The chalcogenide material used for phase-change applications in rewritable optical storage (Ge2Sb2Te5) has been integrated with a 0-5-mum radiation-hardened CMOS process to produce 64-Kbit memory arrays. On selected arrays, electrical testing demonstrated up to 100% memory cell yield, 100-ns programming and read speeds, and write currents,as low-as 1 mA/bit. Devices functioned normally from -55degreesC to. 125degreesC. Write/read endurance has been demonstrated to 1 x 10(8) before first bit failure. Total ionizing dose (TID) testing to 2 Mrad(Si) showed no degradation of chalcogenide memory elements but it identified a write current generator circuit degradation specific to the test chip, which can be easily corrected in the next generation of array and product. Static single-event effects (SEE) testing showed no effect to an effective linear energy transfer (LETEFF) of 98 MeV/mg/cm(2). Dynamic SEE testing showed no latchup or single-event gate rupture (SEGR) to an LETEFF of 123 MeV/mg/cm(2). Two sensitive circuits, neither containing chalcogenide elements, and both with small error cross sections, were identified. The sense amp appears sensitive to transients when reading the high-resistance state. The write driver circuit may be falsely activated during a read cycle, resulting in a reprogrammed bit. Radiation results show no degradation to the hardened CMOS or effects that can be attributed to the phase-change material.
引用
收藏
页码:1878 / 1884
页数:7
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