Memory performance and retention of an all-organic ferroelectric-like memory transistor

被引:56
作者
Schroeder, R [1 ]
Majewski, LA [1 ]
Voigt, M [1 ]
Grell, M [1 ]
机构
[1] Univ Sheffield, Dept Phys & Astron, Sheffield S3 7RH, S Yorkshire, England
基金
英国工程与自然科学研究理事会;
关键词
ferroelectric memory; nonvolatile memory; organic compounds; plastics;
D O I
10.1109/LED.2004.841186
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have built a nonvolatile memory field-effect transistor (FET)-based on organic compounds. The gate-insulating polymer features ferroelectric-like characteristics when spun from solution into an amorphous phase. Thus, the memory transistor is built using techniques developed for organic transistors without requiring high temperature annealing steps. The memory exhibits channel resistance modulations and retention times close in performance to inorganic ferroelectric FETs (FEFETs), yet at a fraction of the cost.
引用
收藏
页码:69 / 71
页数:3
相关论文
共 26 条
  • [1] A new pixel circuit for active matrix organic light emitting diodes
    Goh, JC
    Chung, HJ
    Jang, J
    Han, CH
    [J]. IEEE ELECTRON DEVICE LETTERS, 2002, 23 (09) : 544 - 546
  • [2] Grell M, 2001, ADV MATER, V13, P577, DOI 10.1002/1521-4095(200104)13:8<577::AID-ADMA577>3.3.CO
  • [3] 2-B
  • [4] REALIZATION OF A BLUE-LIGHT-EMITTING DEVICE USING POLY(PARA-PHENYLENE)
    GREM, G
    LEDITZKY, G
    ULLRICH, B
    LEISING, G
    [J]. ADVANCED MATERIALS, 1992, 4 (01) : 36 - 37
  • [5] Organic field-effect transistors with polarizable gate insulators
    Katz, HE
    Hong, XM
    Dodabalapur, A
    Sarpeshkar, R
    [J]. JOURNAL OF APPLIED PHYSICS, 2002, 91 (03) : 1572 - 1576
  • [6] Ferroelectric Pb(Zr0.52Ti0.48)/SiC field-effect transistor
    Koo, SM
    Khartsev, S
    Zetterling, CM
    Grishin, A
    Ostling, M
    [J]. APPLIED PHYSICS LETTERS, 2003, 83 (19) : 3975 - 3977
  • [7] A polymer transistor circuit using PDHTT
    Krumm, J
    Eckert, E
    Glauert, WH
    Ullmann, A
    Fix, W
    Clemens, W
    [J]. IEEE ELECTRON DEVICE LETTERS, 2004, 25 (06) : 399 - 401
  • [8] Advances in high κ gate dielectrics for Si and III-V semiconductors
    Kwo, J
    Hong, M
    Busch, B
    Muller, DA
    Chabal, YJ
    Kortan, AR
    Mannaerts, JP
    Yang, B
    Ye, P
    Gossmann, H
    Sergent, AM
    Ng, KK
    Bude, J
    Schulte, WH
    Garfunkel, E
    Gustafsson, T
    [J]. JOURNAL OF CRYSTAL GROWTH, 2003, 251 (1-4) : 645 - 650
  • [9] One transistor ferroelectric memory devices with improved retention characteristics
    Li, TK
    Hsu, ST
    Ulrich, B
    Stecker, L
    Evans, D
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (11B): : 6890 - 6894
  • [10] Li YQ, 2002, ADV MATER, V14, P1317, DOI 10.1002/1521-4095(20020916)14:18<1317::AID-ADMA1317>3.0.CO