Substrate heating influence on plume propagation during pulsed laser deposition of complex oxides

被引：54

作者：

Sambri, A. ^{[1
]}

Amoruso, S. ^{[1
]}

Wang, X. ^{[1
]}

Radovic, M. ^{[1
]}

Granozio, F. Miletto ^{[1
]}

Bruzzese, R. ^{[1
]}

机构：

[1] Univ Studi Naples Federico II, Comples Univ Monte S Angelo, Dipartimento Sci Fis, CNR,INFM, I-80126 Naples, Italy

来源：

APPLIED PHYSICS LETTERS | 2007年 / 91卷 / 15期

关键词：

D O I：

10.1063/1.2795792

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We investigate the effects of the substrate-heater temperature on the expansion dynamics of laser plumes of complex oxides in oxygen atmosphere. We observed a considerable reduction of the background gas resistance to plume propagation as the substrate temperature was increased, leading to a remarkable change in the velocity of the species impacting the substrate during film growth. The deposition temperature thus influences film growth not only through its direct thermal effect on surface kinetics of adatoms, but also by affecting the energetic properties of the precursors in the gas phase. We interpret the results with a simplified model of plume front propagation, accounting for the change in the background gas density induced by the substrate temperature.

引用

页数：3

共 12 条

[1] Characterization of LaMnO3 laser ablation in oxygen by ion probe and optical emission spectroscopy [J].